Design of Wafer Level Device Irradiation and The Parameters Extraction Equipment Based on X-ray Irradiation

Autor:	李豫东 Li Yu-dong, 郭 旗 Guo Qi, 于 钢 Yu Gang, 张兴尧 Zhang Xin-yao, 于 新 Yu Xin, 何承发 He Cheng-fa, 荀明珠 Xun Ming-zhu, 文 林 Wen Lin
Rok vydání:	2017
Předmět:	Radiation Materials science business.industry Extraction (chemistry) Optoelectronics Wafer X ray irradiation Irradiation Condensed Matter Physics business Electronic Optical and Magnetic Materials
Zdroj:	Chinese Journal of Luminescence. 38:828-834
ISSN:	1000-7032
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e56effd2c64a7ef5473dbf14e99c1266 https://doi.org/10.3788/fgxb20173806.0828 Zobrazit plný text záznamu