Fabrication of DFB laser gratings using synchrotron radiation proximity lithography
| Autor: | Massimo Gentili, L. Grella, Franco Cerrina, G. Meneghini, Q. Leonard, D. Plumb, R. Kumar, M. Baciocchi |
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| Rok vydání: | 1992 |
| Předmět: |
Distributed feedback laser
Materials science business.industry Synchrotron radiation Grating Condensed Matter Physics Laser Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Optics Resist law Optoelectronics Dry etching Electrical and Electronic Engineering business Lithography Electron-beam lithography |
| Zdroj: | Microelectronic Engineering. 17:551-554 |
| ISSN: | 0167-9317 |
| Popis: | First and second order gratings for 1.55 μm distributed feed-back lasers (DFB) have been fabricated in InP using synchrotron radiation proximity lithography . High resolution X-ray masks with 1 st and 2 nd order DFB laser gratings were fabricated by Electron Beam Lithography (EBL) using a single-level resist process and gold electroplating. The resulting 0.23 μm and 0.46 μm period structures were used to transfer a grating image into InP, using synchrotron radiation (SR). A 5μm mask to wafer gap was used. Both positive and negative X-ray resists were used to define the images on InP, and subsequently, were transferred into InP by dry etching process. Issues related to the fidelity of the image transfer process and the control of the line to space ratio on the mask are also discussed. |
| Databáze: | OpenAIRE |
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