Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering
| Autor: | Stanislav Haviar, Radomír Čerstvý, Jindřich Musil, Martin Jaroš |
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| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Alloy Analytical chemistry Biasing 02 engineering and technology Electron Sputter deposition engineering.material 021001 nanoscience & nanotechnology Condensed Matter Physics Microstructure 01 natural sciences Surfaces Coatings and Films Magnetic field 0103 physical sciences Cavity magnetron engineering High ratio 0210 nano-technology Instrumentation |
| Zdroj: | Vacuum. 158:52-59 |
| ISSN: | 0042-207X |
| Popis: | The article reports on the effect of the energy ℰ delivered into the growing film on its macrostress, microstructure, mechanical properties and resistance to cracking of Ti(Al,V)N films. The Ti(Al,V)N films were deposited on Si(111) and Mo substrates by magnetron sputtering in a mixture Ar + N2 gases using a dual magnetron with closed magnetic field and equipped with TiAlV (6 at.% Al, 4 at.% V) alloy targets. It is shown that the compressive macrostress σ in sputtered films can be reduced either by the pulsed bipolar bias voltage Usp with alternating negative and positive pulses or the electron and ion bombardment during overshoots in the pulsed magnetron sputtering. All sputtered films with high ratio H/E∗ ≥ 0.1, compressive macrostress (σ |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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