Method for measuring thermal accommodation coefficients of gases on thin film surfaces using a MEMS sensor structure
| Autor: | Peter Woias, Andreas Meier, F. Völklein, Christina Kunz, Jonas Heidler, Mario Grau |
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| Rok vydání: | 2016 |
| Předmět: |
Microelectromechanical systems
Materials science business.industry Nanotechnology 02 engineering and technology Surfaces and Interfaces Chemical vapor deposition Combustion chemical vapor deposition 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 010305 fluids & plasmas Surfaces Coatings and Films Pulsed laser deposition Atomic layer deposition Physical vapor deposition 0103 physical sciences Deposition (phase transition) Optoelectronics Thin film 0210 nano-technology business |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 34:041601 |
| ISSN: | 1520-8559 0734-2101 |
| Popis: | A method for measuring the thermal accommodation coefficient α for surface-/gas interfaces is presented. It allows the determination of α for thin films produced by a variety of deposition technologies, such as chemical vapor deposition, physical vapor deposition, and atomic layer deposition (ALD). The setup is based on two microelectromechanical systems (MEMS) Pirani sensors facing each other in a defined positioning. Because these MEMS sensors show a very high sensitivity in their individual molecular flow regimes, it is possible to measure the accommodation coefficients of gases without the disturbing influence of the transition regime. This paper presents the analytical background and the actual measurement principle. The results for air and nitrogen molecules on sputtered Au and Pt surfaces are presented. |
| Databáze: | OpenAIRE |
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