| Autor: | E. Bouyer, R. Henne, Günter Schiller, M. Müller |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
Materials science
Thermal decomposition Condensation Analytical chemistry Bioengineering General Chemistry Chemical vapor deposition Condensed Matter Physics Atomic and Molecular Physics and Optics Solution precursor plasma spray Chemical engineering Modeling and Simulation visual_art visual_art.visual_art_medium Deposition (phase transition) General Materials Science Ceramic Inductively coupled plasma Plasma processing |
| Zdroj: | Journal of Nanoparticle Research. 3:371-376 |
| ISSN: | 1388-0764 |
| Popis: | A novel thermal plasma process, based on Thermal Plasma Chemical Vapor Deposition (TPCVD) for producing nanostructured ceramics from liquid precursors is described. The process combines the rapid thermal decomposition of low-cost liquid precursors injected into an Inductively Coupled Plasma (ICP) with a fast gas phase condensation due to the high cooling rate and short residence time existing in such a plasma. Examples of synthesis of Si-based nanostructured ceramic materials (SiC, Si3N4) as powders or coatings are given. Deposition rates of up to 10 μm/min can be achieved by the present technique. |
| Databáze: | OpenAIRE |
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