The effects of oxygen exposure on the electrical conductance characteristics of high frequency oxygen plasma anodized Al films

Autor:	Zhi-yuan Xu, Zhao-Qi Sun, Ai-xia Li, Da-Ming Sun
Rok vydání:	1997
Předmět:	Materials science Anodizing Oxide Analytical chemistry Plasma Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound Lattice constant Electrical resistance and conductance chemistry OXYGEN EXPOSURE Instrumentation Layer (electronics) Sheet resistance
Zdroj:	Vacuum. 48:953-956
ISSN:	0042-207X
DOI:	10.1016/s0042-207x(97)00121-8
Popis:	This paper discusses the dependence of the electrical conductance characteristic of high frequency oxygen plasma anodized Al film on the oxygen exposure during the anodization process. The results showed that under the same anodization conditions, the surface resistance of the oxide film is 6.56~ 0.11 Ω □ (where Ω/□ denotes the unit of sheet resistance) when the vacuum evaporated Al film is thick (750 ~ 800 nm) and the resistance is 1256~ 4.81 Ω □ when the Al film is thin (37~ 82 nm). The results also showed that the surface oxide layer in the aluminum oxide film is γ-Al2O3 with a lattice constant a o = 7.9124 A . At a constant temperature, the electrical conductance characteristic of the plasma anodized Al film depends on the oxygen exposure during the anodization process.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e34fc5eaeac2cf8585dd8dcd727ed49e https://doi.org/10.1016/s0042-207x(97)00121-8 Zobrazit plný text záznamu Full Text from ScienceDirect