Lower-Submicron Patterning Process for BiSrCaCuO High-Tc Superconducting Thin Films

Autor:	Masao Nakao, Shigeo Suzuki, Hiroaki Furukawa, Ryokan Yuasa, Shuji Fujiwara
Rok vydání:	1993
Předmět:	High-temperature superconductivity Scanning electron microscope Chemistry General Engineering Analytical chemistry General Physics and Astronomy Focused ion beam Isotropic etching law.invention Ion law Etching (microfabrication) Irradiation Thin film
Zdroj:	Japanese Journal of Applied Physics. 32:685
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.32.685
Popis:	Ion bombardment enhanced etching (IBEE) has been successfully applied to BiSrCaCuO high-T c superconducting thin films using nonaqueous Br2 solution. It was found that the etch rate of the damaged region which was formed by the ion irradiation with a 200 keV Si++ focused ion beam was enhanced with the Br2 treatment. The critical dose of the IBEE process was about 1×1014 ions/cm2, which is roughly the same as the dose which destroys the superconductivity of the film. Bridge structures with a width of 0.2 µm were successfully fabricated with little degradation in T c and J c. The 0.2-µm bridge had a J c value of more than 105 A/cm2 below 20 K.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e2e8a84f71debc8beecdff05b9f93c3c https://doi.org/10.1143/jjap.32.685 Zobrazit plný text záznamu