High‐Performance Zinc Tin Oxide TFTs with Active Layers Deposited by Atomic Layer Deposition

Autor:	Shantam Ravan, Neil P. Dasgupta, Orlando Trejo, Robin E. Rodríguez, Christopher R. Allemang, Rebecca L. Peterson, Tae H. Cho
Rok vydání:	2020
Předmět:	010302 applied physics Zinc tin oxide Atomic layer deposition Materials science Chemical engineering Thin-film transistor 0103 physical sciences 02 engineering and technology 021001 nanoscience & nanotechnology 0210 nano-technology 01 natural sciences Electronic Optical and Magnetic Materials
Zdroj:	Advanced Electronic Materials. 6:2000195
ISSN:	2199-160X
DOI:	10.1002/aelm.202000195
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e2d70988fc3535e7393d8f7e9f31b84c https://doi.org/10.1002/aelm.202000195 Zobrazit plný text záznamu Plný text