Wear-resistive and electrically conductive nitrogen-containing DLC film consisting of ultra-thin multilayers prepared by using filtered arc deposition
Autor: | Shinsuke Kunitsugu, Masao Kamiya, Satoru Kaneko, Toru Harigai, Yushi Iijima, Hidenobu Gonda, Shigeki Takago, Hitoe Habuchi, Yoshiyuki Suda, Satoshi Degai, Hirofumi Takikawa, Makoto Taki, Tsuyoshi Tanimoto, Koki Tamekuni, Haruyuki Yasui |
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Rok vydání: | 2019 |
Předmět: |
010302 applied physics
Resistive touchscreen Materials science Physics and Astronomy (miscellaneous) Bilayer General Engineering General Physics and Astronomy Polishing 01 natural sciences chemistry.chemical_compound chemistry Tungsten carbide Electrical resistivity and conductivity 0103 physical sciences Monolayer Composite material Layer (electronics) Deposition (law) |
Zdroj: | Japanese Journal of Applied Physics. 58:SEED05 |
ISSN: | 1347-4065 0021-4922 |
Popis: | Nitrogen-containing diamond-like carbon (N-DLC) multilayer films approximately 500 nm thick were fabricated on tungsten carbide substrates as surface protective films with high wear-resistive and conductive properties. Each layer thickness of the N-DLC multilayer films was approximately 10 nm, and the films were a periodic bilayer structure consisting of hard and soft N-DLC layers. Owing to the high abrasion resistance of the hard layer and the low aggressiveness and high adhesion of the soft layer, the multilayer films showed good polishing and wear resistances compared with the hard N-DLC monolayer film, and the electrical resistivity was about half. In the case of DLC multilayer films consisting of hard N-free DLC and N-DLC films, the decrease of each layer thickness leads to the reduction of the polishing resistance. From X-ray reflectivity analysis of ultra-thin N-free DLC films, it was indicated that the film density of an ultra-thin N-free DLC film is lower than that of a thick N-free DLC film. In the DLC multilayer film with thin N-free DLC layers, it is possible that the polishing resistance of the whole DLC film reduced because the hardness the N-free DLC layer was decreased due to the low film density of each N-free DLC layer. |
Databáze: | OpenAIRE |
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