Transparent Conducting Indium Tin Oxide Films Prepared by Pulsed Laser Deposition Using High Power ArF Excimer Laser
| Autor: | Yoshiyuki Tani, Akihito Mori, Masahiro Okuda, Jun Sakamoto, Akio Suzuki, Takanori Aoki, Tatsuhiko Matsushita |
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| Rok vydání: | 2002 |
| Předmět: |
Materials science
Excimer laser Scanning electron microscope medicine.medical_treatment Doping Analytical chemistry Oxide Substrate (electronics) Condensed Matter Physics Surfaces Coatings and Films Pulsed laser deposition Indium tin oxide chemistry.chemical_compound chemistry medicine Surface roughness Electrical and Electronic Engineering |
| Zdroj: | SHINKU. 45:243-246 |
| ISSN: | 1880-9413 0559-8516 |
| DOI: | 10.3131/jvsj.45.243 |
| Popis: | In2O3 doped with 5 wt% SnO2 (indium-tin oxide (ITO) (5 wt%)) films were deposited on glass substrates by pulsed laser deposition using an ArF excimer laser (λ= 193 nm). In all experiments, repetition rates of 150 Hz, the energy density of 6 J/cm2, and an ablation time of 30-900 sec were used. A lowest resistivity of 8.45 × 10-5 Ω ·cm and an optical transmittance of more than 80% in the visible range of the spectrum were obtained for ITO (5 wt%) films of approximately 300-nm thickness fabricated at a substrate temperature of 400°C and oxygen pressure of 10 Pa. Smooth surfaces with an average surface roughness of 1.26 nm were observed by field-emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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