Pareto charts for defect analysis with correlation of inline defects to failed bitmap data

Autor: Robyn Sue Coleman, Louis Breaux, Dave Kolar
Rok vydání: 1994
Předmět:
Zdroj: Handbook of Critical Dimension Metrology and Process Control: A Critical Review.
ISSN: 0277-786X
DOI: 10.1117/12.187459
Popis: Pareto analysis has become one of the most important and widely used tools in solving quality problems. The usefulness of Pareto analysis extends well beyond the application to defect data being applicable to most every department in a company including marketing, production planning, purchasing, sales, maintenance, personnel, accounting, etc. A proper implementation of this tool requires an understanding of the techniques that have been developed and knowing its limitations. In the microelectronics industry processing and analysis of defect data relies heavily on Pareto analysis. With inline defect scanning tools becoming faster and more sensitive, a program to monitor inline defectivity on a regular basis is justified. Correlation of this data with end-of-line electrical failure analysis provides the most accurate Pareto of the most important "killer" defect types.
Databáze: OpenAIRE