Growth, Thermal Stability and Cu Diffusivity of Reactively Sputtered NbN Thin Films as Diffusion Barriers between Cu and Si

Autor: Chih-Huang Lai, Chiapyng Lee, Po-Hao Tsai, Jing-Cheng Lin, Cheng-Lin Huang, Hsing-An Huang
Rok vydání: 2013
Předmět:
Zdroj: ECS Journal of Solid State Science and Technology. 2:N152-N158
ISSN: 2162-8777
2162-8769
DOI: 10.1149/2.025307jss
Databáze: OpenAIRE