Characterization of Atomic Layer Deposited Al2O3/HfO2 and Ta2O5/Al2O3 Combination Stacks

Autor:	EunMi Choi, Keunwon Kang, Soon Hyeong Kwon, Areum Kim, Minwoo Nam, Seon Jae Lee, Sung Gyu Pyo
Rok vydání:	2016
Předmět:	Materials science business.industry Optoelectronics General Materials Science 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 0210 nano-technology business 01 natural sciences Layer (electronics) 0104 chemical sciences Characterization (materials science)
Zdroj:	Science of Advanced Materials. 8:1958-1962
ISSN:	1947-2935
DOI:	10.1166/sam.2016.2854
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e209b0771310d9bb6c024fc0a038106d https://doi.org/10.1166/sam.2016.2854 Zobrazit plný text záznamu