Electrochemical deposition of indium: nucleation mode and diffusional limitation
| Autor: | Mikhail Nauryzbayev, Andrey Kurbatov, R.J. Jumanova, A. M. Argimbaeva, Florence Vacandio, B. D. Burkitbayeva, Gulmira Rakhymbay, Philippe Knauth, Marielle Eyraud |
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| Rok vydání: | 2016 |
| Předmět: |
Horizontal scan rate
Diffusion Analytical chemistry Nucleation chemistry.chemical_element 02 engineering and technology Activation energy 010402 general chemistry 021001 nanoscience & nanotechnology Electrochemistry 01 natural sciences 0104 chemical sciences Ion chemistry Deposition (phase transition) 0210 nano-technology Indium |
| Zdroj: | Russian Journal of Electrochemistry. 52:99-105 |
| ISSN: | 1608-3342 1023-1935 |
| DOI: | 10.1134/s1023193516020087 |
| Popis: | the electrochemical deposition of indium metal from InCl3 solutions was investigated. Cyclovoltammetric experiments showed that the initial hydrogen evolution reaction, observed together with the metal deposition on Pt surface, is blocked when the surface is covered by In. At large cathodic potentials, the current is diffusion-limited. The scan rate dependence of cyclovoltammograms allowed the determination of the diffusion coefficient of In3+ ions, 8.18 × 10–6 cm2/s, using the Delahay equation. The activation energy of diffusion, determined from the temperature dependence of cyclovoltammograms, is about 0.3 eV (23 kJ/mol). Chrono-amperometric experiments are consistent with the cyclovoltammetry; the In3+ diffusion coefficient determined using the Cottrell law is in good agreement with the value determined by the Randles-Sevcik equation. Moreover the use of the nucleation models developed by Scharifker and Hills showed a progressive nucleation mode. Electron microscopy observations and X-ray diffraction patterns confirmed the formation of crystalline indium deposits. |
| Databáze: | OpenAIRE |
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