Electron spectroscopy for chemical analysis studies on electron beam evaporated CuOx thin films
| Autor: | D.P. Gandhi, S.C. Sabharwal, Mukul Gupta, K.P. Muthe, J.C. Vyas, Kulwant Singh, V.K Handu, G.P. Kothiyal |
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| Rok vydání: | 1994 |
| Předmět: |
Suboxide
Copper oxide Chemistry Ultra-high vacuum Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Evaporation (deposition) Copper Electron spectroscopy Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Materials Chemistry Thin film Molecular beam epitaxy |
| Zdroj: | Thin Solid Films. 249:140-143 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(94)90751-x |
| Popis: | Electron spectroscopy for chemical analysis studies were carried out on CuOx films deposited onto yttria-stabilized zirconia single-crystal substrates by electron-beam evaporation under molecular beam epitaxy conditions. The measurements were taken without exposing the films to the atmosphere. The results show that copper oxide dissociates under electron-beam heating in high vacuum and the reassociation of copper and oxygen to form suboxide (CuOx) at the substrate is a function of its temperature. The maximum oxygen content was found to be about 46% of the starting source material at the growth temperature of 500 °C, above which the CuOx film starts to decompose. |
| Databáze: | OpenAIRE |
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