Alternative to die-to-database mask inspection

Autor:	Parkson W. Chen
Rok vydání:	1992
Předmět:	Automated optical inspection Engineering Database business.industry Mask inspection computer.software_genre Die (integrated circuit) law.invention Lens (optics) Automated X-ray inspection law Reticle Computer vision Artificial intelligence Photomask Stepper business computer
Zdroj:	11th Annual BACUS Symposium on Photomask Technology.
ISSN:	0277-786X
Popis:	Qualification of a reticle is a very important step for a mask shop. For defect inspection, automatic die to die inspection can detect the random defects and the die to database inspection system can detect the missing patterns as well as the pattern placement of the reticle. When die size becomes larger, and the field size of the stepper lens is limited,it is a common practice that only one die is placed on a reticle.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e121dc00021ad9f405a9b275ba90fe4c https://doi.org/10.1117/12.56941 Zobrazit plný text záznamu