The future of silicon-on-insulator (SOI) technology in microelectronic systems

Autor: J.C. Zolper, D.J. Radack, Z.J. Lemnios
Rok vydání: 2005
Předmět:
Zdroj: 2004 IEEE International SOI Conference (IEEE Cat. No.04CH37573).
DOI: 10.1109/soi.2004.1391532
Popis: After many years of materials development and circuit research, silicon-on-insulator (SOI) technology clearly has become a viable approach for high performance microelectronics. As semiconductor technology continues to scale, the value of an SOI materials platform continues to expand. It has become a key technology to enable a new class of micro-scale functionality, through 3-D circuits and mixed technology integration.
Databáze: OpenAIRE