ChemInform Abstract: Chemical Vapor Deposition of Silver Films for Superconducting Wire Applications

Autor:	W. B. Carter, J. A. Hanigofsky, D. N. Hill, Michael J. Shapiro, E. K. Barefield, W. J. Lackey
Rok vydání:	2010
Předmět:	Barrier layer Superconductivity Chemical engineering Chemistry Superconducting wire engineering General Medicine Chemical vapor deposition A fibers engineering.material Overlayer
Zdroj:	ChemInform. 23
ISSN:	0931-7597
DOI:	10.1002/chin.199249291
Popis:	Chemical vapor deposition (CVD) was used to deposit silver films for superconducting wire applications. AgI, silver trifluoroacetate (Ag(TFA)), and perfluoro-1-methylpropenylsilver (Ag(PF)) produced the most promising silver films. CVD processing was optimized on these three precursors using thermodynamic calculations performed using a modified version of the SOLGASMIX-PV computer program. Ag(PF) produced the highest quality silver films at low temperatures and pressures. A fiber tow which contained a silver barrier layer and a YBa2Cu3Ox overlayer was found to be a superconductor at 72 K.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e0a226513c78405022bf85a0bbde0af5 https://doi.org/10.1002/chin.199249291 Zobrazit plný text záznamu Plný text