Atomic Force Microscopy-Based Static Plowing Lithography Using CaCO3 Nanoparticle Resist Layers as a Substrate-Flexible Selective Metal Deposition Resist

Autor:	Monisola K. Okeowo, Sasanka B. Ulapane, Cindy L. Berrie, Jennifer L. Doolin
Rok vydání:	2021
Předmět:	Metal deposition General Energy Materials science Resist Atomic force microscopy Nanoparticle Nanotechnology Substrate (printing) Physical and Theoretical Chemistry Lithography Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	The Journal of Physical Chemistry C. 125:23490-23500
ISSN:	1932-7455 1932-7447
DOI:	10.1021/acs.jpcc.1c07239
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e078b147ccea009a9b81e3b06d91bcf9 https://doi.org/10.1021/acs.jpcc.1c07239 Zobrazit plný text záznamu