| Autor: |
Alan D. Kathman, Donald C. O'Shea, Dennis W. Prather, Thomas J. Suleski |
| Rok vydání: |
2009 |
| Předmět: |
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| DOI: |
10.1117/3.527861.ch7 |
| Popis: |
The photolithographic processes used for fabrication of diffractive optical elements adapted from the microelectronics industry were broadly described in the previous chapter. These methods are based on the use of photoresist. A more detailed photoresist processing sequence is shown in Fig. 7.1. In this chapter we examine the principles of photolithography and etching and explore their application to the fabrication of diffractive optical elements using binary lithographic masks. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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