Simulation of the proton implantation process in silicon

Autor:	Thomas Wuebben, Moriz Jelinek, Martin Faccinelli, Hans-Joachim Schulze, Peter Hadley, Johannes Georg Laven
Rok vydání:	2016
Předmět:	Silicon business.industry Annealing (metallurgy) Proton implantation chemistry.chemical_element Condensed Matter Physics Crystallographic defect Semimetal Ion implantation chemistry Scientific method Optoelectronics Process simulation business
Zdroj:	physica status solidi c. 13:750-755
ISSN:	1610-1642 1862-6351
DOI:	10.1002/pssc.201600038
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::dfc47dfa99e4ef64dc300aeb5aefec4b https://doi.org/10.1002/pssc.201600038 Zobrazit plný text záznamu Plný text