Maskless lithography
| Autor: | R. Fabian Pease |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Spatial light modulator
business.industry Computer science Electrical engineering Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Projector law Enhanced Data Rates for GSM Evolution Electrical and Electronic Engineering Photolithography Photomask business Throughput (business) Lithography Maskless lithography |
| Zdroj: | Microelectronic Engineering. :381-392 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/j.mee.2005.01.009 |
| Popis: | The high and rising cost of photomasks (largely driven by writing times exceeding 24 h) is driving the exploration of maskless lithography for applications requiring throughput about 1cm^2/s which is about one tenth that of an optical projection exposure system. Achieving this throughput with charged particle lithography requires currents 10,000 times larger than those presently used and hence sets up the need for charged particle optics radically different from those being used today. Achieving this throughput with optical maskless lithography at the required minimum features sizes of 65nm and below is a serious engineering challenge for the spatial light modulator. Meeting 10% or even 1% of the throughput requirement might still result in mask writing and inspection technologies that would lead to significantly less expensive masks. Furthermore, relaxing the requirements on control of individual edge positions (i.e., a fixed-shape projector) would significantly ease the above challenges. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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