High opto-electronic quality n-type single-crystalline-like GaAs thin films on flexible metal substrates

Autor: Pavel Dutta, Venkat Selvamanickam, Sara Pouladi, Ying Gao, Sicong Sun, Yan Yao, Ali Khadimallah, Monika Rathi, Yongkuan Li, Jae-Hyun Ryou, Phil Ahrenkiel, Devendra Khatiwada, Nan Zheng
Rok vydání: 2017
Předmět:
Zdroj: Journal of Materials Chemistry C. 5:7919-7926
ISSN: 2050-7534
2050-7526
DOI: 10.1039/c7tc02443f
Popis: In this report, we present a detailed study of the microstructural and opto-electronic properties of single-crystalline-like n-type GaAs thin films directly grown on inexpensive flexible metal substrates by metal–organic chemical vapor deposition (MOCVD). The ion-beam-assisted deposition technique (IBAD) was used to obtain highly oriented single-crystalline-like buffer templates on polycrystalline metal substrates. Single-crystalline-like n-type GaAs films were achieved with sharp biaxial texture and strong (00l) crystallographic orientation. Controllable n-doping from 1016–1019 cm−3 was achieved using silane (SiH4) as the dopant precursor. The GaAs films were granular with a wide distribution of grain sizes ranging from 1 to 4 μm. Strong optical photoluminescence at room temperature was obtained and the peak intensity increased with increasing doping level. Electron mobility values as high as 1320 cm2 V−1 s−1 were obtained, one of the highest reported so far for GaAs films grown directly on unconventional substrates. Unlike GaAs on wafer substrates, the electron mobility of single-crystalline-like GaAs films significantly increased with doping which appears to be controlled by the electrical properties of the grain boundaries. High-mobility n-GaAs films on low-cost metal substrates are promising for flexible electronic and photonic device applications.
Databáze: OpenAIRE