Vacuum spark and spherical pinch x-ray/EUV point sources

Autor:	Kazimierz W. Wirpszo, Wen-Chieh Tang, Emilio Panarella, Frank F. Wu
Rok vydání:	1999
Předmět:	Physics Optics business.industry Point source Extreme ultraviolet Extreme ultraviolet lithography Spark (mathematics) Pinch Optoelectronics Plasma Radiation business Lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.351113
Popis:	The technology of x-ray/EUV point plasma sources is competing with the multiple beam synchrotrons as radiation sources for submicron lithography. The company ALFT has been doing research and development on two plasma point sources for several years now. They are the vacuum spark (VSX) and spherical pinch (SPX) technologies. Both have a long history of previous research to support the contention that are well qualified to be converted into technological tools for the manufacturing of the next generation of IC chips. The VSX is essentially a miniature discharge capable of emitting soft x-ray radiation. Because the plasma emits a small dose of x- ray in each spark, it is necessary to repeat the phenomenon at high frequency in order to meet the requirement for microlithography. The SPX is mainly a strong source of EUV/X-ray radiation that operates at a frequency of one hertz or more.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::de8cb56f23d8d4808da4a6898f0fb5b8 https://doi.org/10.1117/12.351113 Zobrazit plný text záznamu