XUV optics characterization at the National Institute of Standards and Technology

Autor:	William T. Estler, Joseph Fu, Richard D. Deslattes, T Mcwaid, Christopher J. Evans, Richard N. Watts, Theodore V. Vorburger, Ariel Caticha, Thomas B. Lucatorto, R.P. Madden, Charles S. Tarrio
Rok vydání:	1993
Předmět:	Diffraction Nuclear and High Energy Physics Materials science Optics business.industry Extreme ultraviolet NIST Surface finish business Reflectometry Instrumentation Characterization (materials science) Metrology
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 79:244-246
ISSN:	0168-583X
DOI:	10.1016/0168-583x(93)95335-3
Popis:	The National Institute of Standards and Technology (NIST) is establishing a complete measurement program for the characterization of extreme ultraviolet (XUV) multilayer optics. In this paper we describe our existing and proposed efforts in surface figure and surface finish metrology, X-ray diffraction, and XUV reflectometry.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::de7120c45fdb15f7917d3ec3bf7dfeed https://doi.org/10.1016/0168-583x(93)95335-3 Zobrazit plný text záznamu