53.1: 2.6 inch HDTV Panel Using CG Silicon

Autor:	Mitsuaki Osame, Yoshifumi Tanada, Hiromi Sakamoto, Masaya Hijikigawa, Shumpei Yamazaki, Naoki Makita
Rok vydání:	2000
Předmět:	Materials science Silicon business.industry Electrical engineering chemistry.chemical_element Substrate (electronics) Catalysis law.invention chemistry Getter law Optoelectronics Metal catalyst Crystallization business
Zdroj:	SID Symposium Digest of Technical Papers. 31:1190-1193
ISSN:	2168-0159 0097-966X
DOI:	10.1889/1.1832878
Popis:	2.6 inch HDTV panel has been developed on the CORNINNG 1737 glass substrate using low temperature CG Silicon (Continuous Grain Silicon). This time we have fabricated TFTs using CG Silicon which uses crystallization with metal catalyst (Ni) and the process to remove this catalyst from channel regions by gettering below 550[°C].
Databáze:	OpenAIRE
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