NBTI Improvement under Highly Compressive Contact Etching Stop Layer (CESL) for 45nm Node CMOS and Beyond
| Autor: | Kun-Hsien Lee, Cheng Tung Huang, Chia-Wen Liang, Osbert Cheng, Wen-Han Hung, Li-Shian Jeng, M. L. Tseng, Shyh-Fann Ting |
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| Rok vydání: | 2006 |
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| Zdroj: | Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials. |
| DOI: | 10.7567/ssdm.2006.f-6-1 |
| Databáze: | OpenAIRE |
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