Characterization of Cu−Rh/SiO2 by temperature-programmed desorption (TPD) of hydrogen

Autor:	Yee Soong, Steven S. C. Chuang, Richard P. Noceti, R.R. Schehl
Rok vydání:	1992
Předmět:	Hydrogen chemistry Thermal desorption spectroscopy Chemisorption Scientific method Inorganic chemistry chemistry.chemical_element Physical and Theoretical Chemistry Catalysis Characterization (materials science)
Zdroj:	Reaction Kinetics & Catalysis Letters. 48:31-36
ISSN:	1588-2837 0133-1736
DOI:	10.1007/bf02070063
Popis:	The presence of Cu on Rh/SiO2 inhibited H2 chemisorption at 303 K and suppressed CO hydrogenation. TPD study shows that chemisorption of H2 on Cu−Rh/SiO2 is an activated process at 303 K.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ddb1d739a46080867fdd6cd0d5302361 https://doi.org/10.1007/bf02070063 Zobrazit plný text záznamu Full text from SpringerLink