Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography

Autor:	Mohamed Zidan, Daniel Fischer, Joren Severi, Danilo De Simone, Alain Moussa, Angelika Müllender, Chris Mack, Anne-Laure Charley, Philippe Leray, Stefan De Gendt, Gian Francesco Lorusso
Rok vydání:	2022
Zdroj:	Journal of Micro/Nanopatterning, Materials, and Metrology. 22
ISSN:	2708-8340
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::dd8f68f0e43edf44ff28c3e38951008a https://doi.org/10.1117/1.jmm.22.2.021002 Zobrazit plný text záznamu