Automated CMP multi-slurry ratio tuning for Defect Reduction : APC : Advanced Process Control

Autor:	Russell McCabe, Abbas Arab, Mike Jeppson, Kevin Ward, David Berry, Subhadeep Mukherjee, Yi Yang
Rok vydání:	2023
Zdroj:	2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::dd4999f3a3a68b987a7f3b0556c9330c https://doi.org/10.1109/asmc57536.2023.10121132 Zobrazit plný text záznamu