| Autor: |
Yu Pang Chang, Simon T C Wang, Kuo Yu Wang, Link Chang |
| Rok vydání: |
2015 |
| Předmět: |
|
| Zdroj: |
2015 IEEE 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits. |
| DOI: |
10.1109/ipfa.2015.7224372 |
| Popis: |
As the founded of nano-probing technique on Scanning Electron Microscope (SEM) base system, the Active Voltage Contrast (AVC) and electron beam absorbed current (EBAC) technique are easier to apply on failure analysis. Both these two can isolate failure location accurately, and high resistance site also can be located by these powerful tools. Based on passed analysis experience, we will investigate and present the utilization of these two techniques to develop the better condition. By the investigating on test circuit of metal/via chain, the better effective analysis skill can be applied to the related high resistance failure analysis. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
