Erratum: Effect of thermal annealing treatments on the optical activation of Tb3+-doped amorphous SiC:H thin films (2016J. Phys. D: Appl.49375104)

Autor:	F. De Zela, L Montañez, K. Tucto, J. A. Guerra, Albrecht Winnacker, Roland Weingärtner, J A Töfflinger
Rok vydání:	2016
Předmět:	Materials science Acoustics and Ultrasonics Doping Analytical chemistry Thin film Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid
Zdroj:	Journal of Physics D: Applied Physics. 49:409601
ISSN:	1361-6463 0022-3727
DOI:	10.1088/0022-3727/49/40/409601
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::dcd227515392aa809471c2e9b73f6b9d https://doi.org/10.1088/0022-3727/49/40/409601 Zobrazit plný text záznamu