| Popis: |
In recent years ion implantation has become a commonplace of semiconductor manufacture and it has also been applied with increasing success to a widening range of other material requirements. The review considers some of the factors - and, in particular, the successful prevention of space charge defocusing - which underlay this translation of the heavy ion accelerator from the scientific laboratory to the factory floor and it notes their possible impact on certain of the new and more demanding ion-beam implantation opportunities which are now emerging. |
