Electron beam induced carbon deposition using hydrocarbon contamination for XTEM analysis
| Autor: | J.S. Luo, W.S. Hsu, L.Y. Huang, Jeremy D. Russell, C.S. Sung |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
Chemistry
Analytical chemistry chemistry.chemical_element Condensed Matter Physics Focused ion beam Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Carbon deposition Transmission electron microscopy Cathode ray Hydrocarbon contamination Physics::Accelerator Physics Electrical and Electronic Engineering Electron beam-induced deposition Safety Risk Reliability and Quality Layer (electronics) Carbon |
| Zdroj: | Microelectronics Reliability. 50:1446-1450 |
| ISSN: | 0026-2714 |
| DOI: | 10.1016/j.microrel.2010.07.046 |
| Popis: | The optimal parameters of electron beam induced carbon deposition (EBICD) using hydrocarbon contamination were studied as a function of electron beam energy and scanning time to avoid the mixing or damage layer formation at the interface of the electron beam assisted Pt protection layer and the sample surface by dual beam focused ion beam (DB FIB) for cross sectional transmission electron microscopy (XTEM) analysis. The optimal condition of EBICD was determined. The thickness of EBICD layer increases with electron beam scanning time and amount of hydrocarbon contamination on the sample surface. EBICD using hydrocarbon contamination successfully provides a carbon protection layer for XTEM analysis. |
| Databáze: | OpenAIRE |
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