Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Autor:	Christine Y. Ouyang, Souvik Chakrabarty, Markos Trikeriotis, Emmanuel P. Giannelis, Marie Krysak, Kyoungyong Cho, Christopher K. Ober
Rok vydání:	2013
Předmět:	chemistry.chemical_compound Materials science Resist chemistry Extreme ultraviolet lithography Oxide Nanoparticle High resolution Nanotechnology Photoresist Tone (literature) Mechanism (sociology)
Zdroj:	Extreme Ultraviolet (EUV) Lithography IV.
ISSN:	0277-786X
Popis:	DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::dc774b486c065eda288b242a603a8c32 https://doi.org/10.1117/12.2011490 Zobrazit plný text záznamu