Autor: |
Christine Y. Ouyang, Souvik Chakrabarty, Markos Trikeriotis, Emmanuel P. Giannelis, Marie Krysak, Kyoungyong Cho, Christopher K. Ober |
Rok vydání: |
2013 |
Předmět: |
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Zdroj: |
Extreme Ultraviolet (EUV) Lithography IV. |
ISSN: |
0277-786X |
Popis: |
DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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