Spectroellipsometric investigation of optical properties of SiO2 grown by wet thermal oxidation
| Autor: | Sigurd Schrader, Paolo Imperia, M Gartner, Octavian Buiu, I. Cernica, C Flueraru, R Radoi |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
Thermal oxidation
Materials science Silicon business.industry chemistry.chemical_element Surfaces and Interfaces Substrate (electronics) Refractive index profile Condensed Matter Physics Surfaces Coatings and Films Characterization (materials science) Optics chemistry Thermal Materials Chemistry Thin film Composite material business Refractive index |
| Zdroj: | Surface Science. :448-452 |
| ISSN: | 0039-6028 |
| DOI: | 10.1016/s0039-6028(00)01037-2 |
| Popis: | Spectroellipsometry represents a powerful technique in non-destructive and contactless material characterization. In this paper, using the above mentioned spectroellipsometric technique, we measure the refractive index profile of wet thermal SiO2 films on single-crystal silicon substrate under various thermal oxidation conditions. The optimum conditions for an accurate evaluation of the thin films parameters – refractive index and thickness – are determined. The effect of different oxidation conditions upon these parameters are further investigated. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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