Carbon Layer as a New Material for Optics

Autor:	Richard Clergereaux, F. Gaillard, Patrice Raynaud, D. Escaich, S. Martin
Rok vydání:	2004
Předmět:	Materials science business.industry chemistry.chemical_element Plasma Conductivity Power (physics) chemistry.chemical_compound Monomer chemistry Scientific method Optoelectronics Deposition (phase transition) business Refractive index Carbon
Zdroj:	MRS Proceedings. 817
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-817-l6.23
Popis:	Plasma enhanced CVD produces carbon layers with various properties which are highly correlated to the different process parameters such as monomer structure, plasma type or plasma power. For example, the modification of monomer (CH4 to C4H10) or the plasma source and the increase of plasma power lead to an optical band-gap which runs from 0.9 to 4.3eV, a conductivity from 5·103 to 5·105S.m−1 and a refractive index from 1.47 to 2.76. Then, it is able to control the optical and electrical film properties from the external process parameters. This paper will thus be focused on the description of relation between deposition parameters, structural characteristics of material and film properties. These materials can then be used for optoelectronics applications.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::dc354139156c93336f2669c81798c0e4 https://doi.org/10.1557/proc-817-l6.23 Zobrazit plný text záznamu Full text from SpringerLink