Formation and Characterization of Thin Silicon Dioxide Films Obtained by Inductively-Coupled High-Density Plasmas using a Dual Rotated Spiral Antenna System

Autor:	Sang Ho Woo, Jung-Min Ji, Chang-Koo Kim, Hai-Won Kim, Yil Wook Kim, Pyung Yong Um
Rok vydání:	2009
Předmět:	Spiral antenna chemistry.chemical_compound Materials science chemistry business.industry Silicon dioxide Analytical chemistry Optoelectronics High density Plasma business Dual (category theory) Characterization (materials science)
Zdroj:	ECS Transactions. 25:173-178
ISSN:	1938-6737 1938-5862
DOI:	10.1149/1.3206617
Popis:	Thin silicon dioxide films were obtained by low-temperature plasma oxidation. Plasma oxidation was performed using a specially-designed new plasma source, called dual rotated spiral antenna (DuRoSA) system. This new plasma source produced high density plasmas (~ 1012 cm-3) having relatively low electron temperatures (2.5 ~ 4 eV). The temperature dependence of the plasma oxidation was found to be less sensitive than that of the high temperature thermal oxidation. The decrease in both oxidation rate and electron density with increasing oxygen fraction suggested that the negative oxygen ions may play the key role in plasma oxidation.
Databáze:	OpenAIRE
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