A New Inspection Method for Phase-Shift Mask (PSM) on Deep-UV Inspection Light Source

Autor:	Shinji Sugihara, Kyoji Yamashita, Hideo Tsuchiya, Mitsuo Tabata, Ikunao Isomura
Rok vydání:	2002
Předmět:	Signal processing Physics and Astronomy (miscellaneous) business.industry Computer science Inspection method General Engineering General Physics and Astronomy Mask inspection Wavelength Optics Light source Phase-shift mask business Sensitivity (electronics)
Zdroj:	Japanese Journal of Applied Physics. 41:4233-4237
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.41.4233
Popis:	As the mask pattern becomes smaller and more complex, the demand for a highly precise mask inspection system with high detection sensitivity and few false defects increases. In regard to inspection systems using a deep-UV wavelength, some issues have been encountered concerning inspection of an ArF-halftone (ArF-HT) mask, which is now entering practically used. In this paper, we report the defect detection sensitivity of Cr and KrF-HT masks, and discuss the issues concerning ArF-HT mask inspection and countermeasures to deal with them.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::db76d1705fdaaf6abde761db96a8c266 https://doi.org/10.1143/jjap.41.4233 Zobrazit plný text záznamu