Study of a Metal Gate and Silicon Selective 'Dry Ash Only' Process for Combined Extension and Halo Implanted Photo Resist

Autor:	G. Mannaert, Mikhail R. Baklanov, D. Goossens, Johann Vertommen, Werner Boullart
Rok vydání:	2007
DOI:	10.4028/3-908451-46-9.113
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::db75140d270d80b6013a8ee2abe6019f https://doi.org/10.4028/3-908451-46-9.113 Zobrazit plný text záznamu