Thermochemical etching effect of H2O vapor on CVD diamond film

Autor:	Hideki Ohkoshi, Keizo Uematsu, Tsutomu Kurita, Katsuichi Saito, Nozomu Uchida
Rok vydání:	1991
Předmět:	Inorganic Chemistry Chemical engineering Etching (microfabrication) Chemistry Vapor pressure Materials Chemistry A diamond Mineralogy Chemical vapor deposition Dry etching Hydrogen etching Reactive-ion etching Condensed Matter Physics
Zdroj:	Journal of Crystal Growth. 114:565-568
ISSN:	0022-0248
DOI:	10.1016/0022-0248(91)90401-p
Popis:	The thermochemical etching effect of H 2 O vapor was examined on a diamond film which was synthesized by the simple thermofilament CVD method. The etching conditions are H 2 O vapor pressure 0.47 atm at 800°C for 10 min. The etching power was milder than that of thermochemical O 2 etching and stronger than atomic hydrogen etching. The growth process of CVD diamond was also discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::db4426faf2b8966c3456bac6e7ef0261 https://doi.org/10.1016/0022-0248(91)90401-p Zobrazit plný text záznamu