Is it time to change mask magnification?

Autor:	Gilbert V. Shelden
Rok vydání:	2001
Předmět:	Engineering business.industry Computer graphics (images) Reticle Magnification Node (circuits) Computer vision Artificial intelligence Photomask business Lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.410757
Popis:	Last year's first reduction ration workshop ended in a consensus to maintain mask magnification at 4X, presentations at the meeting centered on when the mask industry could be ready for the lOOnm and 70nm lithography nodes as defined in the ITRS. The majority of the participants indicated by survey that they believed an increase in magnification from 4X to 5X or 6X is needed to pull the projected availability of photomasks in two years (2002) at the lOOnm node. Equivalently keeping the scan/field height a 22mm allows for 5X reticles to remain on 6" substrates. Some support was shown for 7" reticles but very little for 9" reticles based on the perceived difficulty to manufacture and high costs.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::db38ffb91b5a1057a2b089f28ac4460b https://doi.org/10.1117/12.410757 Zobrazit plný text záznamu