Orientation of Block Copolymer Resists on Interlayer Dielectrics with Tunable Surface Energy

Autor:	Paul F. Nealey, Hyo Seon Suh, Huiman Kang, Chi-Chun Liu, Kookheon Char
Rok vydání:	2009
Předmět:	Materials science Polymers and Plastics Organic Chemistry Substrate (electronics) Dielectric Surface energy Inorganic Chemistry Resist Chemical engineering Polymer chemistry Materials Chemistry Copolymer Surface modification Wetting Thin film
Zdroj:	Macromolecules. 43:461-466
ISSN:	1520-5835 0024-9297
DOI:	10.1021/ma901987q
Popis:	It has been well established that one of most important factors to control the orientation of microdomains in block copolymer (BCP) films is the wetting behavior of a BCP at the interface (or on a substrate). From this perspective, we studied the wetting behavior of P(S-b-MMA) thin films on organosilicate (OS) interlayer dielectric layers (ILDs), which were employed as the target substrates for patterning by BCP lithography. We controlled the surface energy of OS substrates by varying the cure temperature of OS substrates ranging from 200 to 400 °C. As the cure temperature was increased, the wetting behavior of a P(S-b-MMA) film on the OS substrate changed from the asymmetric to the symmetric wetting, as confirmed by AFM, which, in turn, allowed us to find the optimal cure temperature for neutral wetting behavior. As a result, we obtained perpendicularly oriented BCP microdomains on the OS substrate cured at 360 °C without further surface modification. Finally, we were able to transfer sub-25 nm BCP patte...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::db0adb07737888041e94744dadf406f1 https://doi.org/10.1021/ma901987q Zobrazit plný text záznamu