Application of silylether and silylester polymer for chemical amplification system

Autor:	Tadayoshi Kokubo, Akira Umehara, Toshiaki Aoai, Yoshimasa Aotani
Rok vydání:	1990
Předmět:	chemistry.chemical_classification Polymers and Plastics Organic Chemistry Polymer Photoresist Rate-determining step Decomposition chemistry.chemical_compound Silicone chemistry Nucleophile Polymer chemistry Materials Chemistry SN2 reaction Dissolution
Zdroj:	Journal of Photopolymer Science and Technology. 3:389-400
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.3.389
Popis:	A Chemical Amplification system using silylether and silylester polymers as an acid labile compound was investigated. The effects of their structural parameters were examined in terms of their acid catalyzed decomposition rates. A bulkiness of the substituents on Si atom was the dominant parameter for these silicone polymers. The results supported the proposed mechanism of the acid decomposition that SN2 type nucleophilic attack of water to Si atom is involved as the rate determining step. Disulphone compounds were examined for their usefulness as a photoacid generator to be combined with these silicone polymers. The disulphones desirably exhibited a rapid absorption bleaching with acid generation upon deep UV irradiation. A three components chemical amplification composition, utilizing the disulphones, the silicone polymers as a dissolution inhibitor and a novolac resin, was tested lithographically, and was proved to work as a deep UV positive photoresist.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::dae794e957c2064323d08f0045327595 https://doi.org/10.2494/photopolymer.3.389 Zobrazit plný text záznamu