Nano-Scale Texturing of Borosilicate Glasses Using CF4-Based Plasma Discharge for Application in Thin Film Solar Cells
| Autor: | Jung Wook Lim, Hee Chul Lee, Heon Lee, Sun Jin Yun, Hyung Soo Kim |
|---|---|
| Rok vydání: | 2012 |
| Předmět: |
Materials science
Borosilicate glass business.industry Biomedical Engineering Flux Bioengineering General Chemistry Substrate (electronics) Plasma Condensed Matter Physics Chemical reaction Ion law.invention Optics Chemical engineering law Solar cell General Materials Science business Nanoscopic scale |
| Zdroj: | Journal of Nanoscience and Nanotechnology. 12:3464-3468 |
| ISSN: | 1533-4899 1533-4880 |
| Popis: | Random plasma treatment techniques were used as a texturing method to reduce the surface reflection of glass substrates in thin film solar cells. Various gas mixtures were used for the plasma discharge in an effort to examine the texturing mechanism. Using a plasma treatment comprising CF4/O2 and CF4/Ar with a gas flow ratio of 1 to 2, the surface reflectance could be decreased to 6.83% and 6.82%, respectively. The surface treatment was very effective with the use of a low RF power of 50 W and an optimal time of 5 min. It is considered that the optical characteristics of the glass substrate are highly correlated to its surface morphology which can be produced not only through nano-scale chemical reactions with radicals but also through ion flux bombardment. |
| Databáze: | OpenAIRE |
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