Microstructure isolation testing using a scanning electron microscope
| Autor: | T.J. Aton, S. S. Mahant‐Shetti, M. H. Bennett‐Lilley, R. J. Gale |
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| Rok vydání: | 1990 |
| Předmět: |
Conventional transmission electron microscope
Materials science Microscope Physics and Astronomy (miscellaneous) business.industry Scanning electron microscope Low-voltage electron microscope Analytical chemistry law.invention law Scanning transmission electron microscopy Optoelectronics Electron microscope Electron beam-induced deposition business Environmental scanning electron microscope |
| Zdroj: | Applied Physics Letters. 56:2310-2312 |
| ISSN: | 1077-3118 0003-6951 |
| DOI: | 10.1063/1.102927 |
| Popis: | A new form of testing is described that is suitable for verifying isolation in many forms of microstructures. Excess charge is deposited on the microstructures by a scanning electron microscope (SEM) beam. On elements of the microstructures that are isolated, this excess charge induces a voltage contrast that is detected at the same time by the same beam. Isolation to approximately 2×1011 Ω can be verified. The method is simple and fast, requiring only a standard SEM and simple test structures. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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