Electroless deposition of copper indium diselenide thin films
| Autor: | A.S.N. Murthy, Akhlesh Gupta |
|---|---|
| Rok vydání: | 1991 |
| Předmět: |
Chalcopyrite
Mechanical Engineering Analytical chemistry chemistry.chemical_element Condensed Matter Physics Microstructure Copper Diselenide Carbon film chemistry Chemical engineering Mechanics of Materials visual_art visual_art.visual_art_medium General Materials Science Thin film Electroplating Indium |
| Zdroj: | Materials Research Bulletin. 26:1323-1330 |
| ISSN: | 0025-5408 |
| DOI: | 10.1016/0025-5408(91)90148-f |
| Popis: | Thin films of copper indium diselenide are deposited on Ti substrates by a simple and inexpensive electroless technique. The compositional, structural and morphological properties of the as such and annealed films are studied. The films are of single phase and chalcopyrite structure with (112) preferred orientation. The morphology of the films is found sensitive to the Cu/In ratio. |
| Databáze: | OpenAIRE |
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