Using response surface methodology to optimize the stereolithography process

Autor: Gamal Weheba, Adolfo Sanchez‐Marsa
Rok vydání: 2006
Předmět:
Zdroj: Rapid Prototyping Journal. 12:72-77
ISSN: 1355-2546
DOI: 10.1108/13552540610652401
Popis: Purpose – The purpose of this paper is to present a study of the stereolithography apparatus SLA 250‐50 motivated by the introduction of the new epoxy resin AccuGen™.Design/methodology/approach – Several process variables are examined using a Box‐Behnken design and optimization techniques are employed to determine their optimal settings.Findings – The results indicate operating conditions at which high levels of performance can be achieved.Research limitations/implications – The results reported in this research are process specific, however, the methodology employed can be readily applied to different rapid prototyping processes.Practical implications – Effective utilization of the SL process.Originality/value – Quantitative understanding of the process capability in relation to key process variables.
Databáze: OpenAIRE