Beam Alignment and Convergence Analysis of Scanning Beam Interference Lithography Systems
| Autor: | 宋莹 Song Ying, 王玮 Wang Wei, 姜珊 Jiang Shan, 潘明忠 Pan Ming-zhong, 巴音贺希格 Bayanheshig |
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| Rok vydání: | 2016 |
| Předmět: |
Materials science
business.industry 02 engineering and technology Scanning beam 01 natural sciences Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Interference lithography 010309 optics 020210 optoelectronics & photonics Optics 0103 physical sciences Convergence (routing) 0202 electrical engineering electronic engineering information engineering Stencil lithography Laser beam quality Electrical and Electronic Engineering business Beam (structure) Maskless lithography |
| Zdroj: | Chinese Journal of Lasers. 43:1205001 |
| ISSN: | 0258-7025 |
| DOI: | 10.3788/cjl201643.1205001 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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