| Popis: |
For the scaling of ultrathin body double gate (UTB DG) MOSFETs to channel lengths below 10 nm, a silicon body thickness of less than 5 nm is required. At these dimensions the influence of atomic scale roughness at the interface between the silicon body and the gate dielectric becomes significant, producing appreciable body thickness fluctuations. These fluctuations result in a scattering potential related to the quantum confinement variation within the channel which, similarly to the interface roughness scattering, influences the mobility, the drive current and the intrinsic parameter variations. In this paper we have developed an ensemble Monte Carlo simulation approach to study the impact of quantum confinement scattering on the transport in sub-10 nm UTB DG MOSFETs, and the corresponding intrinsic parameter variations. By comparing the Monte Carlo simulations with drift-diffusion simulations we quantify the important contribution of the quantum confinement related scattering to the current fluctuations in such devices |
